Low-frequency dependence of plasma characteristics in dual-frequency capacitively coupled plasma sources

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journal：Applied Physics Letters

Authors：Yang Zhou; Kai Zhao; Fang-Fang Ma; Yong-Xin Liu; Fei Gao; Julian Schulze; You-Nian Wang

Published date：2024-2-5

DOI：10.1063/5.0190803

PDF link：https://pubs.aip.org/aip/apl/art ... 102_1_5.0190803.pdf

Article link：http://dx.doi.org/10.1063/5.0190803

Article Source：AIP Publishing。

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