Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer

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journal：ACS Applied Materials & Interfaces

Authors：Chun Cao; Yiwei Qiu; Lingling Guan; Zhen Wei; Zhenyao Yang; Lanxin Zhan; Dazhao Zhu; Chenliang Ding; Xiaoming Shen; Xianmeng Xia; Cuifang Kuang; Xu Liu

Published date：2022-7-13

DOI：10.1021/acsami.2c08063

PDF link：https://pubs.acs.org/doi/pdf/10.1021/acsami.2c08063

Article link：http://dx.doi.org/10.1021/acsami.2c08063

Article Source：American Chemical Society (ACS)。

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[ACS] Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer

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