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[Other] Modeling and control of L-type network impedance matching for semiconductor plasma etch

Golam_Zakaria Post time The day before yesterday 13:48 | Show all posts |Read mode
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journal：Journal of Vacuum Science & Technology B

Authors：Carlos Rodriguez; Jairo Viola; YangQuan Chen; Joaquin Alvarez

Published date：2024-3-1

DOI：10.1116/6.0003444

PDF link：https://pubs.aip.org/avs/jvb/art ... 212_1_6.0003444.pdf

Article link：http://dx.doi.org/10.1116/6.0003444

Article Source：American Vacuum Society。


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bevrayamraj Post time The day before yesterday 14:23 | Show all posts

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