[SPIE] Development of deep ultraviolet optical maskless exposure tool for advanced lithography |
Reward10points
|
| |
post
reply
points
40
25
Refining metal ablation and polishing with high-power femtosecond fiber laser
25
Characterizing focusing units for micromachining with ultrashort laser pulses
10
FPGA based CNN accelerator for high-speed biomedical application
10
Dual-tunable metamaterial absorber based on solid ion gel-graphene sandwich structure
10
Quantum physics applied to modern optical metal oxide semiconductor transistor
