[SPIE] Evaluation of deep learning model for 3D profiling of HAR features using high-voltage CD-SEM

sjm356 Post time 2022-5-13 07:29:33 | Show all posts |Read mode
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journal:Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Authors:Wei Sun; Yasunori Goto; Takuma Yamamoto; Keiichiro Hitomi

Published date:2021-2-22

DOI:10.1117/12.2592052

Article link:http://dx.doi.org/10.1117/12.2592052

Article Source:SPIE


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George Post time 2022-5-13 07:29:34 | Show all posts

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